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Electron Beam and X Ray Resists

IP.com Disclosure Number: IPCOM000089337D
Original Publication Date: 1977-Oct-01
Included in the Prior Art Database: 2005-Mar-04
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Hiraoka, H: AUTHOR [+2]

Abstract

The sensitivity of photoactive compounds, when they are used in electron-beam and Xray lithography, can be increased by the addition of salts of 2-diazo-1-oxo-naphthalene-5-sulfonic acid. The calcium and the barium salt are particularly preferred, and are used with proper resins, such as novolak resin.

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Electron Beam and X Ray Resists

The sensitivity of photoactive compounds, when they are used in electron- beam and Xray lithography, can be increased by the addition of salts of 2-diazo- 1-oxo-naphthalene-5-sulfonic acid. The calcium and the barium salt are particularly preferred, and are used with proper resins, such as novolak resin.

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