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Induction Heating Technique for High Rate Copper Evaporation

IP.com Disclosure Number: IPCOM000089448D
Original Publication Date: 1977-Nov-01
Included in the Prior Art Database: 2005-Mar-05
Document File: 2 page(s) / 25K

Publishing Venue

IBM

Related People

Phinney, R: AUTHOR

Abstract

This article describes a technique for high rate continuous evaporation from a copper source using an RF induction heated source.

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Induction Heating Technique for High Rate Copper Evaporation

This article describes a technique for high rate continuous evaporation from a copper source using an RF induction heated source.

This technique employs the use of a tungsten cylindrical insert 10 placed within a pyrolytic boron nitride crucible 12 so as to provide full wall protection for the copper charge. The tungsten serves to increase the coupling coefficient of the RF source 14 and, also, to force the extraction or withdrawal of the molten CuO 16 from the upper boundaries of the Cu + CuO charge. The resulting exposure of the intrinsic Cu to the substrates yielded a significant reduction in the amount of boiling during the evaporation process.

The use of the pyrolytic boron nitride, as the crucible material, provides a long life crucible and, when heated, a lower residual gas background than found in other crucibles suitable for thermal deposition of Cu.

This technique also produces a lower threshold voltage shift value than the previously employed method, i.e., there are less contaminates desorbed from the elevated temperature source and, hence, less trapped, condensed impurities.

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