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Improved Multilayer Antireflective Film

IP.com Disclosure Number: IPCOM000089451D
Original Publication Date: 1977-Nov-01
Included in the Prior Art Database: 2005-Mar-05
Document File: 1 page(s) / 12K

Publishing Venue

IBM

Related People

Stetson, WJ: AUTHOR

Abstract

Metallic film, primarily chromium, with some sort of antireflective layer or layers may offer problems in the semiconductor industry. For example, the film thickness may be such that it cannot be used in a "subtractive process" or the process offers only surface antireflection, or the film produced is useable in the "subtractive process" but is difficult to control during manufacture, and subsequent etching times become prohibitive.

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Improved Multilayer Antireflective Film

Metallic film, primarily chromium, with some sort of antireflective layer or layers may offer problems in the semiconductor industry. For example, the film thickness may be such that it cannot be used in a "subtractive process" or the process offers only surface antireflection, or the film produced is useable in the "subtractive process" but is difficult to control during manufacture, and subsequent etching times become prohibitive.

The film described below is a multilayer film that is less complicated to manufacture and has desirable etch characteristics.

Basically, the process causes an initial antireflective coating to be deposited onto a substrate and covered by a standard chromium layer, which is then covered with another antireflective coating.

The product to be coated with the multilayered film is placed into a standard chromium-coating sputtering apparatus, using argon as plasma-forming medium, and the first antireflective film is produced by adding nitrogen to the sputtering system. The nitrogen so introduced reacts with the sputtered chromium, and a chrome nitride coating is deposited on the substrate. Once a suitable thickness of chrome nitride is deposited, the nitrogen shuts off and the normal deposition of chromium is permitted to proceed until the desired thickness of pure chromium is realized. Following the chromium deposition, nitrogen is again introduced into the chamber, and a second deposit of chrome nit...