Browse Prior Art Database

Substrate Heater for Evaporation Processing

IP.com Disclosure Number: IPCOM000089511D
Original Publication Date: 1977-Nov-01
Included in the Prior Art Database: 2005-Mar-05
Document File: 2 page(s) / 64K

Publishing Venue

IBM

Related People

DuBois, LW: AUTHOR [+4]

Abstract

The figure shows an improved substrate heater arrangement utilized in the manufacture of gas display panels. The heater is utilized to adjust the substrate temperature to the very high levels required prior to evaporation processing.

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Substrate Heater for Evaporation Processing

The figure shows an improved substrate heater arrangement utilized in the manufacture of gas display panels. The heater is utilized to adjust the substrate temperature to the very high levels required prior to evaporation processing.

As shown, quartz infrared lamps 10 are mounted on ceramic stand-offs 12 and shields 13 on a movable flap 15 arranged in the processing line. Reflectors 16 are provided around each lamp to throw heat from the lamp toward the substrate rotation zone. Flexible braided cables 18 are utilized to provide power to the lamps. The flap is hinged to the electron gun shield via hinges 19 to permit movement of the flap and heaters to facilitate insertion and removal of the substrate retaining cage which surrounds the electron-beam crucible.

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