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Scanning X Ray Microsource

IP.com Disclosure Number: IPCOM000089633D
Original Publication Date: 1977-Nov-01
Included in the Prior Art Database: 2005-Mar-05
Document File: 1 page(s) / 13K

Publishing Venue

IBM

Related People

McCorkle, RA: AUTHOR

Abstract

There is need for a high brightness, scanning, monochromatic soft X-ray source for microprobe, as well as photolithography (without masks), applications.

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Scanning X Ray Microsource

There is need for a high brightness, scanning, monochromatic soft X-ray source for microprobe, as well as photolithography (without masks), applications.

A high brightness, scanning, monochromatic X-ray source for uses such as microprobing and maskless photolithography can be obtained from a suitable arrangement of a new high brightness ion source [1] or modifications thereof or alternatives, which include field ionization sources, in which very high current densities (>/~ 10/2//cm/2/) of intermediate-Z ions are made to impinge upon either thick or thin intermediate-Z targets. The targets can be either solid, liquid or gaseous in nature and are chosen with regard to atomic number such that electric "level matching" [2] occurs. Thereby, very high yields of characteristic X-rays, e.g., better than 10/-2/ characteristic photons/steradian-ions are obtainable. The spectral purity of the generated radiation is better than 95%. Thus, a focussed ion beam-target combination could yield in excess of 10/19/ photons (cm/2/ sec. steradians) of monochromatic soft X-rays. By focussing this radiation with suitable combinations of X-ray lenses [3], extremely bright small diameter X-ray spots could be produced.

Moreover, by conventional scanning of the ion beam with respect to the target, the X-ray spot could be swept (or scanned) across the surface of suitable materials placed in the plane of focus of the output X-ray lens. Additionally, conventional mo...