Browse Prior Art Database

Positive Resist System

IP.com Disclosure Number: IPCOM000089913D
Original Publication Date: 1968-Dec-01
Included in the Prior Art Database: 2005-Mar-05
Document File: 2 page(s) / 39K

Publishing Venue

IBM

Related People

Pirog, JA: AUTHOR [+2]

Abstract

This positive resist system is based on the photolytically grafting of a solubizable agent onto a photosensitive polymer. The photosensitive polymer system is composed of a mixture of a polymer having aromatic rings or olefinic bonds in it and a compound containing maleic anhydride and benzophenone moieties as a sensitizer.

This text was extracted from a PDF file.
At least one non-text object (such as an image or picture) has been suppressed.
This is the abbreviated version, containing approximately 100% of the total text.

Page 1 of 2

Positive Resist System

This positive resist system is based on the photolytically grafting of a solubizable agent onto a photosensitive polymer. The photosensitive polymer system is composed of a mixture of a polymer having aromatic rings or olefinic bonds in it and a compound containing maleic anhydride and benzophenone moieties as a sensitizer.

The maleic anhydride-benzohphenone sensitizer reactant can be prepared as follows:

(Image Omitted)

The photosensitive product I is mixed with an aromatic polymer, both in appropriate solvents.

(Image Omitted)

The resulting composition II is coated onto a substrate and exposed to actinic radiation. The unexposed areas can be easily removed by developing with diluted alkali or with ammonia.

1

Page 2 of 2

2

[This page contains 5 pictures or other non-text objects]