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Browse Prior Art Database

Photolytically Solubilized Polysulfonamides

IP.com Disclosure Number: IPCOM000089915D
Original Publication Date: 1968-Dec-01
Included in the Prior Art Database: 2005-Mar-05
Document File: 2 page(s) / 36K

Publishing Venue

IBM

Related People

Angelo, RW: AUTHOR [+4]

Abstract

Polysulfonamides are prepared for use as positive photoresist. These materials can be used to advantage since photolysis of the sulfonamide bond -SO(2) NH-, when exposed to radiation of wave lengths less than 3,000 angstroms, are photolytically cleaved.

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Photolytically Solubilized Polysulfonamides

Polysulfonamides are prepared for use as positive photoresist. These materials can be used to advantage since photolysis of the sulfonamide bond - SO(2) NH-, when exposed to radiation of wave lengths less than 3,000 angstroms, are photolytically cleaved.

The sulfonamide bond can be incorporated into polymers in either of two ways. For example, m-benzene disulfonyl chloride can be condensed with diamine, such as hexamethylene diamine to form the polymer according to the following reactions:

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Additionally, polystyrene can be cross-linked with the sulfonamide linkages according to the following method. A polystyrine can be treated to form the sulfonic acid or acid chloride thereof, e.g.

This modified polymer is mixed with a diamine, such as hexamethylene diamine, to obtain a polymer having the following structure:

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The modified polymers so prepared can be used as a photoresist material. The polymers can be dissolved in a suitable solvent and coated on a substrate. It is then exposed to actinic radiation of 3,000 angstroms or less. Exposure to actinic radiation causes the polymer to be converted to either a linear polymer or to a polymer of much lower molecular weight and, hence, greater solubility. The exposed areas can thus be removed with a suitable solvent.

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