Browse Prior Art Database

Preparing Neoprene Photoresist

IP.com Disclosure Number: IPCOM000089926D
Original Publication Date: 1968-Dec-01
Included in the Prior Art Database: 2005-Mar-05
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Angelo, RW: AUTHOR

Abstract

Neoprene photoresist is prepared by controlling the viscosity of the reaction mass to prevent gelation of it. Neoprene is heated in cyclohexanone at about 115 degrees C. The viscosity of the reaction mass is monitored periodically to assure that it does not exceed between 20 to 50 centistokes measured at 25 degrees C. The viscosity is controlled by passing nitrogen gas through the reaction mass. When the viscosity of the reaction mass reaches a viscosity of between 20 to 50 centistokes, a base is added to the mass. The reaction is continued to completion, care being taken to prevent the viscosity from exceeding 50 centistokes above which gelation occurs.

This text was extracted from a PDF file.
This is the abbreviated version, containing approximately 100% of the total text.

Page 1 of 1

Preparing Neoprene Photoresist

Neoprene photoresist is prepared by controlling the viscosity of the reaction mass to prevent gelation of it. Neoprene is heated in cyclohexanone at about 115 degrees C. The viscosity of the reaction mass is monitored periodically to assure that it does not exceed between 20 to 50 centistokes measured at 25 degrees C. The viscosity is controlled by passing nitrogen gas through the reaction mass. When the viscosity of the reaction mass reaches a viscosity of between 20 to 50 centistokes, a base is added to the mass. The reaction is continued to completion, care being taken to prevent the viscosity from exceeding 50 centistokes above which gelation occurs.

1