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Exposure of Photoresist Using Fiber Optics

IP.com Disclosure Number: IPCOM000090058D
Original Publication Date: 1969-Jan-01
Included in the Prior Art Database: 2005-Mar-05
Document File: 2 page(s) / 33K

Publishing Venue

IBM

Related People

Gonnella, NT: AUTHOR

Abstract

Photoresist film 2, mounted on substrate 3, is selectively exposed by a series of fiber optic elements 5. Each of the latter has one end terminating as a discrete portion of a continuous matrix closely adjoining the surface of film 2. Each element 5 conducts light to a mutually exclusive contiguous surface area. The opposite end of each element 5 confronts a masking device 7 for selectively determining which elements are exposed to light source 8. A punched card functions as mask 7 and is disposed to selectively expose elements 5 in a manner to effect the desired pattern of photoresist exposure.

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Exposure of Photoresist Using Fiber Optics

Photoresist film 2, mounted on substrate 3, is selectively exposed by a series of fiber optic elements 5. Each of the latter has one end terminating as a discrete portion of a continuous matrix closely adjoining the surface of film 2. Each element 5 conducts light to a mutually exclusive contiguous surface area. The opposite end of each element 5 confronts a masking device 7 for selectively determining which elements are exposed to light source 8. A punched card functions as mask 7 and is disposed to selectively expose elements 5 in a manner to effect the desired pattern of photoresist exposure.

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