Browse Prior Art Database

Stopbath

IP.com Disclosure Number: IPCOM000090145D
Original Publication Date: 1969-Feb-01
Included in the Prior Art Database: 2005-Mar-05
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Scheer, HC: AUTHOR [+3]

Abstract

A RISTON* photoresist is coated onto a substrate and exposed to actinic radiation. The photoresist is developed by a solvent, e.g., methyl chloroform. Development of the photoresist is stopped by immersing the photoresist in a FREON* TF stopbath. The use of FREON TF as a stopbath is superior to the recommended use of water as a stopbath. FREON does not dissolve unexposed photoresist. It does not strip the resist from substrates. It is also soluble in the developing solvent and evaporates quickly thus leaving no residue. *Trademark of E. I. du Pont de Nemours and Co.

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Stopbath

A RISTON* photoresist is coated onto a substrate and exposed to actinic radiation. The photoresist is developed by a solvent, e.g., methyl chloroform. Development of the photoresist is stopped by immersing the photoresist in a FREON* TF stopbath. The use of FREON TF as a stopbath is superior to the recommended use of water as a stopbath. FREON does not dissolve unexposed photoresist. It does not strip the resist from substrates. It is also soluble in the developing solvent and evaporates quickly thus leaving no residue. *Trademark of E. I. du Pont de Nemours and Co.

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