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Monitor for Evaporated Thin Films

IP.com Disclosure Number: IPCOM000090302D
Original Publication Date: 1969-Mar-01
Included in the Prior Art Database: 2005-Mar-05
Document File: 2 page(s) / 30K

Publishing Venue

IBM

Related People

Gniewek, JJ: AUTHOR [+2]

Abstract

This system monitors and controls the deposition rate, thickness, and composition of thin films. The apparatus comprises heated source 10 and target 12 enclosed in a vacuum chamber. As the evaporant from source 10 is deposited on target 12, there is a need to monitor and control the deposition rate, thickness, and composition of the thin films. The system accomplishes this by utilizing electron-induced ionization and subsequent x-ray spectroscopy. The system comprises electron gun assembly 20, and an X-ray detection system. The latter comprises collimator 22, diffraction crystal 24, X-ray detector 26, shielding 28, and associated pulse height analyzers and counting circuitry not shown. Electron gun assembly 20, energized by a high-voltage power supply, directs a beam of high-energy electrons onto the surface of a sample, e.

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Monitor for Evaporated Thin Films

This system monitors and controls the deposition rate, thickness, and composition of thin films. The apparatus comprises heated source 10 and target 12 enclosed in a vacuum chamber. As the evaporant from source 10 is deposited on target 12, there is a need to monitor and control the deposition rate, thickness, and composition of the thin films. The system accomplishes this by utilizing electron-induced ionization and subsequent x-ray spectroscopy. The system comprises electron gun assembly 20, and an X-ray detection system. The latter comprises collimator 22, diffraction crystal 24, X-ray detector 26, shielding 28, and associated pulse height analyzers and counting circuitry not shown. Electron gun assembly 20, energized by a high-voltage power supply, directs a beam of high-energy electrons onto the surface of a sample, e.g., target 12, that is concurrently being deposited with a thin film. The X-ray detection system monitors the characteristic X rays emitted from the sample under test. The deposition of any type of thin film including a multicomponent thin film can be monitored by this technique. The wavelengths of the X-ray emissions are a measure of the type of materials being evaporated and the intensity is a measure of the film thickness. The data thus obtained is applicable to devices for controlling the evaporation process on a realtime basis.

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