Browse Prior Art Database

Red Sensitive Photoresist

IP.com Disclosure Number: IPCOM000090423D
Original Publication Date: 1969-Apr-01
Included in the Prior Art Database: 2005-Mar-05
Document File: 2 page(s) / 17K

Publishing Venue

IBM

Related People

Moreau, WM: AUTHOR

Abstract

A photoresist, light-sensitive to the 5000...8000 angstroms region, is formulated having the following composition: Polyvinyl cinnamate 25 g.; Azulene 0.25 g. Chlorobenzene 20 ml. Toluene 70 ml. Methyl cellosolve 10 ml.

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Red Sensitive Photoresist

A photoresist, light-sensitive to the 5000...8000 angstroms region, is formulated having the following composition: Polyvinyl cinnamate 25 g.; Azulene
0.25 g. Chlorobenzene 20 ml. Toluene 70 ml. Methyl cellosolve 10 ml.

The polyvinyl cinnamate is synthesized from polyvinyl alcohol and cinnamoyl chloride in the presence of pyridine in accordance with the procedure described in J. Appl. Polymer Sci. 2, 302, 1959. The average molecular weight is 3500 using a Vapor Pressure Osmometer, Model 301A, a product of Mechrolab. Inc. The remaining materials are commercial materials, research grade 99.5% purity.

The azulene is a cyclopentacyloheptene having the molecular structure

(Image Omitted)

in which the seven carbon ring is a single unsaturated alkene, and the five carbon ring is a cyclic alkane.

An oxide silicon wafer is spin-coated with the above resist to a thickness 1 micron, prebaked at 100 degrees C for five minutes, and exposed for two minutes to 6500...6700 angstroms light. The light is isolated by a bandpass filter from a 1000 watt xenon lamp. The wafer is postbaked at 150 degrees C for 3 minutes and developed in KPR* developer. Insolubilitation of the polymer is sharp in the exposed areas. *Trademark of Eastman Kodak Co.

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