Browse Prior Art Database

Purification of Photoresist

IP.com Disclosure Number: IPCOM000090424D
Original Publication Date: 1969-Apr-01
Included in the Prior Art Database: 2005-Mar-05
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Moreau, WM: AUTHOR

Abstract

Extended storage of photoresist such as Eastman Kodak KTFR*, KPR** and KMER* was found to result in a heterogeneous mixture containing globular matter and emulsified particles which results in the pinholing and scumming upon use of the resist. Restoration of the photoresist is effected by addition of 15 ml. methanol per 100 ml. of photoresist solution followed by such centrifuging of the mixture. The added methanol can then be removed from the centrifuged liquid by vacuum pumping until the methanol, 15 ml., is removed. The solution is then filtered through a one half micron filter for use. *Products of Eastman Kodak Co. **Trademark of Eastman Kodak Co.

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Purification of Photoresist

Extended storage of photoresist such as Eastman Kodak KTFR*, KPR** and KMER* was found to result in a heterogeneous mixture containing globular matter and emulsified particles which results in the pinholing and scumming upon use of the resist. Restoration of the photoresist is effected by addition of 15 ml. methanol per 100 ml. of photoresist solution followed by such centrifuging of the mixture. The added methanol can then be removed from the centrifuged liquid by vacuum pumping until the methanol, 15 ml., is removed. The solution is then filtered through a one half micron filter for use. *Products of Eastman Kodak Co. **Trademark of Eastman Kodak Co.

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