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Rosin Flux Remover

IP.com Disclosure Number: IPCOM000090450D
Original Publication Date: 1969-Apr-01
Included in the Prior Art Database: 2005-Mar-05
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Dackson, WA: AUTHOR [+2]

Abstract

The problem of removing the rosin flux residue becomes greater, as the distance between a semiconductor device and a substrate carrier decreases in the contacts down or flip-chip structure. Azeotropic solvents, such as an azeotrope of 28% isopropyl alcohol and 72% trichloro ethylene, allows complete removal of the rosin residue. The solvent is sprayed onto the surfaces having the rosin residue using nitrogen as the propellant.

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Rosin Flux Remover

The problem of removing the rosin flux residue becomes greater, as the distance between a semiconductor device and a substrate carrier decreases in the contacts down or flip-chip structure. Azeotropic solvents, such as an azeotrope of 28% isopropyl alcohol and 72% trichloro ethylene, allows complete removal of the rosin residue. The solvent is sprayed onto the surfaces having the rosin residue using nitrogen as the propellant.

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