Browse Prior Art Database

Transparent Pattern Mask for Positive Working Photoresist

IP.com Disclosure Number: IPCOM000090601D
Original Publication Date: 1969-May-01
Included in the Prior Art Database: 2005-Mar-05
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Burghardt, RW: AUTHOR

Abstract

Transparent masks for aligning purposes, without loss of line width or masking qualities, are prepared using ultraviolet light for exposure. HRP plates are processed by the usual methods using Kodak reversal techniques. After the reversal process is complete, the plates are bleached in Kodak R-9 bleach solution for 1 minute. The plates are rinsed in water for 15 to 20 seconds and are redeveloped in Shipley Transparent Mask Developer TM2 for 1 minute. After rinsing the redeveloped plates in water for 1 minute, they are fixed in Kodak Rapid Fix for 1 minute, washed in water for 3 minutes, and dried by immersing in alcohol and subjecting them to an air stream. The finished masks have a red-yellow color which acts as a filter for ultraviolet exposure light. The lines of the masks retain their acuity and size.

This text was extracted from a PDF file.
This is the abbreviated version, containing approximately 100% of the total text.

Page 1 of 1

Transparent Pattern Mask for Positive Working Photoresist

Transparent masks for aligning purposes, without loss of line width or masking qualities, are prepared using ultraviolet light for exposure. HRP plates are processed by the usual methods using Kodak reversal techniques. After the reversal process is complete, the plates are bleached in Kodak R-9 bleach solution for 1 minute. The plates are rinsed in water for 15 to 20 seconds and are redeveloped in Shipley Transparent Mask Developer TM2 for 1 minute. After rinsing the redeveloped plates in water for 1 minute, they are fixed in Kodak Rapid Fix for 1 minute, washed in water for 3 minutes, and dried by immersing in alcohol and subjecting them to an air stream. The finished masks have a red- yellow color which acts as a filter for ultraviolet exposure light. The lines of the masks retain their acuity and size. The resist patterns are crisp and sharp.

1