Browse Prior Art Database

Projecting Integrated Circuit Patterns

IP.com Disclosure Number: IPCOM000090646D
Original Publication Date: 1969-Jun-01
Included in the Prior Art Database: 2005-Mar-05
Document File: 2 page(s) / 33K

Publishing Venue

IBM

Related People

Engel, JM: AUTHOR

Abstract

The apparatus is for projecting integrated circuit patterns. It comprises electron beam column 1 having cathode 2 for directing electron beam 2A onto optically transparent dielectric target 3 to deposit a charge pattern representing the circuit pattern desired. The circuit pattern is used for exposing a semiconductor wafer 4 coated with a photoresist. The charge pattern is developed by distributing an electrographic developer material 5 on the target. Then the image is projected onto the wafer by energizing lamp 6 and reflecting the image from mirror 7 through the lens 8 onto the wafer surface. For viewing the image to check alignment and accuracy, a mirror is swung from the dotted position o the position shown to reflect the image through lens 10 onto screen 11.

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Projecting Integrated Circuit Patterns

The apparatus is for projecting integrated circuit patterns. It comprises electron beam column 1 having cathode 2 for directing electron beam 2A onto optically transparent dielectric target 3 to deposit a charge pattern representing the circuit pattern desired. The circuit pattern is used for exposing a semiconductor wafer 4 coated with a photoresist. The charge pattern is developed by distributing an electrographic developer material 5 on the target.

Then the image is projected onto the wafer by energizing lamp 6 and reflecting the image from mirror 7 through the lens 8 onto the wafer surface. For viewing the image to check alignment and accuracy, a mirror is swung from the dotted position o the position shown to reflect the image through lens 10 onto screen 11.

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