Dismiss
InnovationQ will be updated on Sunday, Oct. 22, from 10am ET - noon. You may experience brief service interruptions during that time.
Browse Prior Art Database

Reducing Dust Induced Pinholes in Sputtered Films

IP.com Disclosure Number: IPCOM000090714D
Original Publication Date: 1969-Jun-01
Included in the Prior Art Database: 2005-Mar-05
Document File: 2 page(s) / 40K

Publishing Venue

IBM

Related People

Stern, E: AUTHOR

Abstract

This technique reduces dust-induced pinholes in RF sputtered films. The pinholes result from the flaking off of particles of silicon dioxide, resulting from previous depositions, from the walls of the chamber. These particles are charged by the glow discharge so that, when emitted, they are propelled by electric field gradients onto the substrates. RF sputtering apparatus 1 has chamber 2 in which substrate holder 3 and target 4 are disposed. To prevent the propelling of particles of silicon dioxide from the walls of chamber 2, a coaxial conductive screen or grid 5 is disposed adjacent the walls of chamber 2. Grid 5 has a suitable potential from source 6 applied which prevents the particles from reaching substrates 7 which are mounted on holder 3.

This text was extracted from a PDF file.
At least one non-text object (such as an image or picture) has been suppressed.
This is the abbreviated version, containing approximately 100% of the total text.

Page 1 of 2

Reducing Dust Induced Pinholes in Sputtered Films

This technique reduces dust-induced pinholes in RF sputtered films. The pinholes result from the flaking off of particles of silicon dioxide, resulting from previous depositions, from the walls of the chamber. These particles are charged by the glow discharge so that, when emitted, they are propelled by electric field gradients onto the substrates. RF sputtering apparatus 1 has chamber 2 in which substrate holder 3 and target 4 are disposed. To prevent the propelling of particles of silicon dioxide from the walls of chamber 2, a coaxial conductive screen or grid 5 is disposed adjacent the walls of chamber 2. Grid 5 has a suitable potential from source 6 applied which prevents the particles from reaching substrates 7 which are mounted on holder 3. Alternatively, should it be required to maintain ground potential at the periphery of the glow, an additional screen or grid 8, held at ground potential, is coaxially disposed inside of and spaced from screen 5. Thus, screen 5 is utilized to either repel or attract particles flaking from the wall of chamber 2, while screen 8 presents a grounded surface to the discharge.

1

Page 2 of 2

2

[This page contains 1 picture or other non-text object]