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Application of Photo and Thermally Depolymerizable Polymers as Positive Photoresists

IP.com Disclosure Number: IPCOM000090719D
Original Publication Date: 1969-Jun-01
Included in the Prior Art Database: 2005-Mar-05
Document File: 2 page(s) / 16K

Publishing Venue

IBM

Related People

Pirog, JA: AUTHOR

Abstract

This positive photoresist technique incorporates a thermally depolymerizable Polymer having as its repeating mer units, quaternary-substituted carbon atoms as indicated. (Image Omitted) Where R(i) and R(2), any groups except hydrogen atoms, are utilized. Polymers such as alpha methyl methacrylate, alpha methyl styrene and the like can be used. A substrate coated with the photoresist material is positioned under a heated source, such as, a focused beam from a continuously powered laser and a circuit pattern is scribed by the beam. Alternately, the pattern can be scribed by an unfiltered focused light beam from a high intensity lamp. To insure against the laser beam being deleterious to the substrate, the area to be scribed can be simultaneously subjected to ultraviolet radiation.

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Application of Photo and Thermally Depolymerizable Polymers as Positive Photoresists

This positive photoresist technique incorporates a thermally depolymerizable Polymer having as its repeating mer units, quaternary-substituted carbon atoms as indicated.

(Image Omitted)

Where R(i) and R(2), any groups except hydrogen atoms, are utilized. Polymers such as alpha methyl methacrylate, alpha methyl styrene and the like can be used. A substrate coated with the photoresist material is positioned under a heated source, such as, a focused beam from a continuously powered laser and a circuit pattern is scribed by the beam. Alternately, the pattern can be scribed by an unfiltered focused light beam from a high intensity lamp. To insure against the laser beam being deleterious to the substrate, the area to be scribed can be simultaneously subjected to ultraviolet radiation. The scribed pattern can be developed with conventional solvents.

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