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Browse Prior Art Database

Pre Exposure of Electron Beam Resist to Increase Sensitivity

IP.com Disclosure Number: IPCOM000090887D
Original Publication Date: 1969-Aug-01
Included in the Prior Art Database: 2005-Mar-05
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Broers, AN: AUTHOR [+2]

Abstract

The sensitivity of methacrylate electron resist can be effectively increased by first flooding the resist with electrons. The electron flooding exposure can be made with the same beam which is used to effect the pattern exposure but can also be accomplished with a elementary gun system in which several wafers are exposed simultaneously. The through put of any electron beam resist exposure system can be increased by this technique and the effective sensitivity is increased by a factor of more than two.

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Pre Exposure of Electron Beam Resist to Increase Sensitivity

The sensitivity of methacrylate electron resist can be effectively increased by first flooding the resist with electrons. The electron flooding exposure can be made with the same beam which is used to effect the pattern exposure but can also be accomplished with a elementary gun system in which several wafers are exposed simultaneously. The through put of any electron beam resist exposure system can be increased by this technique and the effective sensitivity is increased by a factor of more than two.

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