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Browse Prior Art Database

Magnetic Thin Film Device

IP.com Disclosure Number: IPCOM000091843D
Original Publication Date: 1968-May-01
Included in the Prior Art Database: 2005-Mar-05
Document File: 2 page(s) / 35K

Publishing Venue

IBM

Related People

York, DB: AUTHOR

Abstract

During the evaporation of a thin magnetic film on an insulating surface, agglomerations of the deposited magnetic material are formed. As a result, large stresses and a nonuniformity of thickness are present in the deposited film. This is avoided by depositing a nucleating layer on the surface of the insulating layer. The nucleating layer produces nucleating centers around which a magnetic film grows. Thus, small agglomerations, evenly dispersed over the surface of the insulating layer, are formed. On metallic substrate 12, adhesive layer 14 is deposited. On the latter there is superimposed silicon monoxide insulating layer 16. Adhering to layer 16, a thin permalloy type ferromagnetic film 20 is deposited. Nucleation layer 18, comprising electrical discontinuities, is interposed between layer 16 and film 20.

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Magnetic Thin Film Device

During the evaporation of a thin magnetic film on an insulating surface, agglomerations of the deposited magnetic material are formed. As a result, large stresses and a nonuniformity of thickness are present in the deposited film. This is avoided by depositing a nucleating layer on the surface of the insulating layer.

The nucleating layer produces nucleating centers around which a magnetic film grows. Thus, small agglomerations, evenly dispersed over the surface of the insulating layer, are formed. On metallic substrate 12, adhesive layer 14 is deposited. On the latter there is superimposed silicon monoxide insulating layer 16. Adhering to layer 16, a thin permalloy type ferromagnetic film 20 is deposited. Nucleation layer 18, comprising electrical discontinuities, is interposed between layer 16 and film 20. Layer 18 is formed from a metal such as Ag, Co, Cr, Ta, Fe, Au, Cu, Ni, V, Ti, and Mn and has a thickness ranging from 10 to 200 A Degrees. A thin magnetic film produced in this manner ensures a minimum of skew of the deposited and intended easy axis, increased reliability, and reduced power requirements.

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