Browse Prior Art Database

Control of Chemical Composition in Bias Sputtering

IP.com Disclosure Number: IPCOM000091859D
Original Publication Date: 1968-Jun-01
Included in the Prior Art Database: 2005-Mar-05
Document File: 2 page(s) / 35K

Publishing Venue

IBM

Related People

Griest, AJ: AUTHOR

Abstract

In this process of bias sputtering, the bias potential on the substrate is regulated so as to control the ultimate magnetostriction of a magnetic thin film. The sputtering is performed in the apparatus which includes glass metallic substrate 10 positioned between anode 11 and nickel iron cobalt cathode 12 all of which are enclosed by housing 13. Gas tight seals 30 join housing 13 to support platform 14. Conductor leads 15, 16, and 17 are coupled to substrate 10, anode 11, and cathode 12 respectively.

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Control of Chemical Composition in Bias Sputtering

In this process of bias sputtering, the bias potential on the substrate is regulated so as to control the ultimate magnetostriction of a magnetic thin film. The sputtering is performed in the apparatus which includes glass metallic substrate 10 positioned between anode 11 and nickel iron cobalt cathode 12 all of which are enclosed by housing 13. Gas tight seals 30 join housing 13 to support platform 14. Conductor leads 15, 16, and 17 are coupled to substrate 10, anode 11, and cathode 12 respectively.

Cathode shield 18 is mounted above cathode 12 to confine the glow discharge to the lower surface of cathode 12. Similarly, shutter 19 is positioned below cathode 12. Vacuum pump 22 is coupled to the apparatus by valve 21 and conduit 20. Inert gas is injected into the apparatus by conduit 23 and valve
25. When sputtering, inert gas is admitted through conduit 23 while pump 22 draws a vacuum within housing 13. While a large negative potential is applied between cathode 12 and anode 11, substrate 10 is based slightly negative with respect to anode 11.

The nickel-iron ratio shifts to higher values as the bias potential is increased. That is, the magnetostriction tends to become less positive or more negative as the bias potential is increased. Although a minimum bias of about -100 volts is necessary to obtain reproducible, uniform magnetic properties is nickel-iron- cobalt films. The nickel-iron ratio can be varied from...