Browse Prior Art Database

Generation of Lines

IP.com Disclosure Number: IPCOM000092052D
Original Publication Date: 1968-Aug-01
Included in the Prior Art Database: 2005-Mar-05
Document File: 2 page(s) / 37K

Publishing Venue

IBM

Related People

Rottmann, HR: AUTHOR

Abstract

The method is for producing masks having extremely fine lines. Two masks with preliminary similar fine lines are used to produce even finer lines on one of the masks. A first mask, drawing 1, consisting of transparent plate 10 having an opaque coating 12 which forms lines 14 of widths D, is covered with photographic emulsion 30. A second mask, consisting of transparent plate 20 having an opaque coating 22 which forms lines 24 of width D, is partially superimposed on the first mask. Light is shined through plate 20 exposing the portion of emulsion 30 under lines 24. After developing, drawing 2, plate 10 is covered with additional opaque area 32. The excess coating is stripped off providing the mask in drawing 3. Lines 14 now have a reduced width D'. Any line pattern can be made thinner by this method.

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Generation of Lines

The method is for producing masks having extremely fine lines. Two masks with preliminary similar fine lines are used to produce even finer lines on one of the masks. A first mask, drawing 1, consisting of transparent plate 10 having an opaque coating 12 which forms lines 14 of widths D, is covered with photographic emulsion 30. A second mask, consisting of transparent plate 20 having an opaque coating 22 which forms lines 24 of width D, is partially superimposed on the first mask. Light is shined through plate 20 exposing the portion of emulsion 30 under lines 24. After developing, drawing 2, plate 10 is covered with additional opaque area 32. The excess coating is stripped off providing the mask in drawing 3. Lines 14 now have a reduced width D'. Any line pattern can be made thinner by this method. The resultant line width is determined by the amount of overlap of the two masks. The accuracy of this method is limited only by the positioning mechanism which superimposes one mask over the other.

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