Browse Prior Art Database

Precision Location of Character Image

IP.com Disclosure Number: IPCOM000092196D
Original Publication Date: 1968-Oct-01
Included in the Prior Art Database: 2005-Mar-05
Document File: 2 page(s) / 31K

Publishing Venue

IBM

Related People

Rabedeau, ME: AUTHOR

Abstract

In a character generator, light beam 1 from source 2 is directed into digital light deflector 3, energized to direct beam 1 onto the desired character 4 on reflective character mask 5. The image of character 4 is formed on target 7 by lens 9, deflector 3, and beam splitter 6. In order to preclude the necessity of using a very accurate deflector 3 to select a character and accurately locate its image at the output of the character generator, mask 5 can be arranged in the system so that the inaccuracies in deflector 3 are compensated by variation in position of characters 4 on mask 5. To generate a position compensating mask, master mask 8 is placed in beam 1 and one character accurately aligned in such beam.

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Precision Location of Character Image

In a character generator, light beam 1 from source 2 is directed into digital light deflector 3, energized to direct beam 1 onto the desired character 4 on reflective character mask 5. The image of character 4 is formed on target 7 by lens 9, deflector 3, and beam splitter 6. In order to preclude the necessity of using a very accurate deflector 3 to select a character and accurately locate its image at the output of the character generator, mask 5 can be arranged in the system so that the inaccuracies in deflector 3 are compensated by variation in position of characters 4 on mask 5. To generate a position compensating mask, master mask 8 is placed in beam 1 and one character accurately aligned in such beam. Deflector 3 is energized to direct beam 1 on the area of unexposed photosensitive mask 5 where the image of the illuminated character 4 is supposed to be. Mask 8 is then moved and a second character 4 is positioned in beam 1 and its image is formed on mask 5 in the appropriate area by correctly energizing deflector 3. This process is continued until all characters of the set are exposed, at which time mask 5 is developed. Mask 8 is then removed and the character generator is ready for use.

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