Browse Prior Art Database

High Speed Artwork Generator

IP.com Disclosure Number: IPCOM000092203D
Original Publication Date: 1968-Oct-01
Included in the Prior Art Database: 2005-Mar-05
Document File: 2 page(s) / 50K

Publishing Venue

IBM

Related People

Hayes, LP: AUTHOR

Abstract

Generation of accurate and repeatable artwork over large fields is achieved without employing a superaccurate positioning table and elite optical systems by using this method. A grid consisting of grass 1 with a plurality of parallel opaque lines 2 of chromium is securely positioned in holder 3. Positioned below the grid and in contact with it is glass master 4 coated with emulsion 5. Light pencil 6, capable of moving in X and Y axes, is located above holder 3. The diameter of the beam at its point of impingement with the grid is slightly wider than the distance between two opaque lines to ensure total exposure of master 4 located below. Since the opaque lines on the grid block any stray light from striking master 4, well-defined lines are generated on such master.

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High Speed Artwork Generator

Generation of accurate and repeatable artwork over large fields is achieved without employing a superaccurate positioning table and elite optical systems by using this method. A grid consisting of grass 1 with a plurality of parallel opaque lines 2 of chromium is securely positioned in holder 3. Positioned below the grid and in contact with it is glass master 4 coated with emulsion 5.

Light pencil 6, capable of moving in X and Y axes, is located above holder 3. The diameter of the beam at its point of impingement with the grid is slightly wider than the distance between two opaque lines to ensure total exposure of master 4 located below. Since the opaque lines on the grid block any stray light from striking master 4, well-defined lines are generated on such master. With the grid in the position shown, the light source is moved to expose all the lines required in the X direction on master 4. The grid is then rotated through 90 degrees and all Y lines on master 4 are exposed. The exposed plate is then developed to produce a master with both X and Y lines. An alternate method of producing an X-Y master is to use two emulsion-coated grids and expose one with X and one with Y lines. The separate X and Y grids, after development, are successively exposed on a third emulsion-coated plate to produce a single master with both X and Y lines.

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