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Optimization of Irregular Pattern Layouts

IP.com Disclosure Number: IPCOM000092223D
Original Publication Date: 1968-Oct-01
Included in the Prior Art Database: 2005-Mar-05
Document File: 5 page(s) / 80K

Publishing Venue

IBM

Related People

Gural, O: AUTHOR

Abstract

A graphical approach is employed to develop a computerized method of laying out irregular patterns such as garment pieces upon a sheet of material with the objective of minimizing waste. Garment piece patterns can be represented in digitized form as a result of computerized pattern grading operations or by the use of other suitable devices such as a Rand tablet. After this digitized input pattern information is obtained, it is processed by a computer in accordance with this method to develop significant data concerning the relationships of the various pieces to one another. Such data is arranged in a graphical format to facilitate its analysis.

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Optimization of Irregular Pattern Layouts

A graphical approach is employed to develop a computerized method of laying out irregular patterns such as garment pieces upon a sheet of material with the objective of minimizing waste. Garment piece patterns can be represented in digitized form as a result of computerized pattern grading operations or by the use of other suitable devices such as a Rand tablet. After this digitized input pattern information is obtained, it is processed by a computer in accordance with this method to develop significant data concerning the relationships of the various pieces to one another. Such data is arranged in a graphical format to facilitate its analysis. The extent to which each piece is capable of matching every other piece under a variety of assumed conditions is expressed in the form of numerical measures, each denoting a maximum value that is obtainable under certain specified constraints. Once these measures are computed, they are tabularly stored along with other information to provide a maximum valued incidence matrix MVIM. This then is systematically analyzed by a computer in accordance with an algorithm specially developed for this purpose to find the optimal pattern layout.

A measure M between two given pieces omega k and omega l is computed by first manipulating the digitized pattern data for these pieces. Such occurs until the outlines of the pieces are figuratively brought into proximity without overlapping. Then some geometric attribute of the juxtaposed pieces is determined. For example, a measure of densest interlocking, denoted M1, is computed by moving pieces omega k and omega l relative to each other, keeping their longitudinal axes parallel, until rectangles Rk and R1 respectively enclosing these two pieces have the maximum amount of overlap, indicated by the cross- hatched area in drawing 1, without causing any overlap of pieces omega k and omega l themselves. This overlap area between rectangles Rk and R1 then constitutes the measure of densest interlocking M1 between pieces omega k and omega l for the assumed orientations of these pieces. M1 also can be referred to as the measure of maximum overlap, provided that this refers to the overlap of the enclosing rectangles, not any overlap of the pieces themselves.

A number of maximum overlap measures can be derived for each pair of pieces according to the respective orientations of these pieces. For example, if omega k has a position omega k1 and omega l has a position omega l1, then a measure M1 is obtained according to this particular relationship. But if either piece changes its orientation by being revolved or flipped around either the X- axis or the Y-axis or both, the value of M1 probably will change. Hence, for any two pieces omega k and omega l, M1 is computed for four positions of omega k and four positions of omega l, the relationship of these positions being indicated below.

Position 2 is attained by flipping the piece f...