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Generating a Selective Protective Coating on Masks

IP.com Disclosure Number: IPCOM000092242D
Original Publication Date: 1968-Oct-01
Included in the Prior Art Database: 2005-Mar-05
Document File: 2 page(s) / 46K

Publishing Venue

IBM

Related People

Sybalsky, J: AUTHOR [+2]

Abstract

This method provides a protective coating for masks used in contact exposure of photosensitive layers and substrates. In such masks, there is a tendency for the image to become damaged. Conventionally, the image or opaque areas of the masks are protected by a continuous protective coating. However, such protective coatings tend to have defects which can affect the transparentness of the mask in the clear areas. This method provides a protective coating selectively formed only over the opaque areas. The mask is completely coated with a positive photoresist film as in A. The coated mask is exposed to ultraviolet radiation preferably through the transparent substrate, drawing B. Upon development, the resist is removed from all clear areas, leaving intact a protective residual resist material on top of the image, drawing C.

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Generating a Selective Protective Coating on Masks

This method provides a protective coating for masks used in contact exposure of photosensitive layers and substrates. In such masks, there is a tendency for the image to become damaged. Conventionally, the image or opaque areas of the masks are protected by a continuous protective coating. However, such protective coatings tend to have defects which can affect the transparentness of the mask in the clear areas. This method provides a protective coating selectively formed only over the opaque areas. The mask is completely coated with a positive photoresist film as in A. The coated mask is exposed to ultraviolet radiation preferably through the transparent substrate, drawing B. Upon development, the resist is removed from all clear areas, leaving intact a protective residual resist material on top of the image, drawing C. This is a result of the radiation shielding by the opaque areas. The developed mask can then be baked to strengthen the selective resist coating.

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