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Electrostatic Precipitator

IP.com Disclosure Number: IPCOM000092310D
Original Publication Date: 1968-Nov-01
Included in the Prior Art Database: 2005-Mar-05
Document File: 2 page(s) / 34K

Publishing Venue

IBM

Related People

Pruvenok, AJ: AUTHOR

Abstract

Electrostatic precipitation is used to prevent the ejection of solid particles in a silicon monoxide vacuum evaporation stream. Source 10 evaporates silicon monoxide 12 for deposition as film 14 on substrate 16. Baffle 18 prevents larger particles 20 of silicon monoxide 12 from being expelled from source 10. Smaller particles 22 are carried from source 10 by evaporant stream 24. To trap these particles 22, collector baffles 26 are mounted above source 10. A very high DC voltage, e.g., between 10,000 and 30,000 volts, is impressed by voltage source 28 between discharge electrodes 30 and baffles 26. Since the gas pressure of stream 24 is between 1 and 5 mm. Hg, corona discharge 32 takes place between discharge electrodes 30 and baffles 26.

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Electrostatic Precipitator

Electrostatic precipitation is used to prevent the ejection of solid particles in a silicon monoxide vacuum evaporation stream. Source 10 evaporates silicon monoxide 12 for deposition as film 14 on substrate 16. Baffle 18 prevents larger particles 20 of silicon monoxide 12 from being expelled from source 10. Smaller particles 22 are carried from source 10 by evaporant stream 24. To trap these particles 22, collector baffles 26 are mounted above source 10. A very high DC voltage, e.g., between 10,000 and 30,000 volts, is impressed by voltage source 28 between discharge electrodes 30 and baffles 26. Since the gas pressure of stream 24 is between 1 and 5 mm. Hg, corona discharge 32 takes place between discharge electrodes 30 and baffles 26. Solid particles 22, passing through corona discharge 32, acquire a negative charge and are attracted to positively charged baffles 26. Removal of solid particles 22 from stream 24 in this manner results in a much more uniform film 14 on substrate 16.

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