Browse Prior Art Database

Use of Acidified Fluorine Solutions as Safe Etchants for Silicon Dioxide

IP.com Disclosure Number: IPCOM000092830D
Original Publication Date: 1967-Mar-01
Included in the Prior Art Database: 2005-Mar-05
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Kaplan, LH: AUTHOR

Abstract

NH(4)F solution can be acidified, as needed, by a mineral acid having 1

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This is the abbreviated version, containing approximately 100% of the total text.

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Use of Acidified Fluorine Solutions as Safe Etchants for Silicon Dioxide

NH(4)F solution can be acidified, as needed, by a mineral acid having 1<pK(a)<4 to provide an SiO(2) etchant and avoid storage of buffered HF solution in a laboratory. In effect, NH(4)F solution is synthesized to provide molecular HF which is capable of etching SiO(2). H(3)PO(4) having a pK(a) of
2.13 is preferred.

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