Browse Prior Art Database

Artwork Generator

IP.com Disclosure Number: IPCOM000093173D
Original Publication Date: 1967-Jun-01
Included in the Prior Art Database: 2005-Mar-06
Document File: 2 page(s) / 34K

Publishing Venue

IBM

Related People

Kosanke, K: AUTHOR [+3]

Abstract

Projection on a photosensitive emulsion of a pattern of drawings such as electronic circuit elements has been performed through light deflectors. After projection these patterns can be employed as a print mask for the actual fabrication of circuits. This artwork projection system eliminates the requirements of known systems for precise positioning of a selected pattern in the input aperture of the projector. This is effected without reducing the precision of the pattern on the emulsion.

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Artwork Generator

Projection on a photosensitive emulsion of a pattern of drawings such as electronic circuit elements has been performed through light deflectors. After projection these patterns can be employed as a print mask for the actual fabrication of circuits. This artwork projection system eliminates the requirements of known systems for precise positioning of a selected pattern in the input aperture of the projector. This is effected without reducing the precision of the pattern on the emulsion.

To eliminate any requirement for precise registration of a selected pattern at the input to the light projector, the Fraunhofer diffraction pattern of a particular symbol is stored on pattern belt PB rather than the symbol itself. Monochromatic light source S is condensed at lens L1 for illuminating the Fraunhofer diffraction pattern of a mechanically selected print pattern such as a semiconductor diode. Lens L3 transforms the Fraunhofer pattern into the symbol pattern. As L3 is firmly mounted, the print pattern appears precisely in the input aperture of the light projector which includes light deflector LD. Thus, the location of the symbol pattern at LD is independent of the location of the Fraunhofer diffraction pattern. LD and lens L2 direct the light beam in the shape of the symbol pattern precisely to the desired location on photosensitive screen PS. The signals supplied to the terminals T1... TN of LD control the position of the symbol on PS.

The Fraunhofer...