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Multiple Etch Process Using Photoresist Techniques

IP.com Disclosure Number: IPCOM000093202D
Original Publication Date: 1967-Jul-01
Included in the Prior Art Database: 2005-Mar-06
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Bolin, HR: AUTHOR

Abstract

An etchant is provided for the chromium layer on a magnetic thin-film device. The etchant includes: Na OH 18g K(3)Fe (CN)(6) 60g H(2)O 300CC Cr Pellet 0.25g.

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Multiple Etch Process Using Photoresist Techniques

An etchant is provided for the chromium layer on a magnetic thin-film device.

The etchant includes: Na OH 18g

K(3)Fe (CN)(6) 60g

H(2)O 300CC

Cr Pellet 0.25g.

1