Browse Prior Art Database

Etch Control Probe

IP.com Disclosure Number: IPCOM000093260D
Original Publication Date: 1967-Aug-01
Included in the Prior Art Database: 2005-Mar-06
Document File: 2 page(s) / 40K

Publishing Venue

IBM

Related People

Mathisen, ES: AUTHOR

Abstract

The apparatus controls the correct etching time for selective etching of materials, e.g., removing sputtered glass on semiconductor wafers. Probe 1 consists of tubing 2 of stainless steel or other suitable conductive material and inner current conductive core 3. Tube 2 and core 3 are electrically insulated from each other by a dielectric 4 which is resistant to the etch solution.

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Etch Control Probe

The apparatus controls the correct etching time for selective etching of materials, e.g., removing sputtered glass on semiconductor wafers. Probe 1 consists of tubing 2 of stainless steel or other suitable conductive material and inner current conductive core 3. Tube 2 and core 3 are electrically insulated from each other by a dielectric 4 which is resistant to the etch solution.

In operation, probe 1 is cleaned and placed in a sputtering furnace, not shown, in position so that probe end 5 faces the dielectric target from the same distance as that of wafers being processed. In this manner probe end 5 has deposited on it sputtered, e.g. glass, at the same rate as the wafers. After completion of the sputtering operation, probe 1 is removed from the furnace with the wafers.

When wafers 6 are ready for the etch process, probe 1 having its end 5 coated with sputtered glass, and the wafers in carrier 7 are immersed in etch solution 8. The leads from probe 1 are then attached to an indicator circuit as shown in B.

When etch solution 8 removes the glass film on the wafers as determined by the masking pattern and coating thickness, the glass deposited on probe end 5 with the same thickness is also removed. Such removal establishes a current path through the solution 8 between probe end 5 and outer conductive shell 2. The electrical current can then be employed for activating either an alarm or automatic carrier lifter or both.

Probe 1 can then be cleane...