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Light Sensitive Metal Organic Chelate Polymers

IP.com Disclosure Number: IPCOM000093261D
Original Publication Date: 1967-Aug-01
Included in the Prior Art Database: 2005-Mar-06
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Saunders, TF: AUTHOR

Abstract

A light-sensitive, metal-organic chelate polymer is used to prepare printed circuits by direct circuit deposition techniques. A water soluble metal chelate polymer is prepared from polyethyleneimine and a silver salt, such as silver nitrate and a silver halide. The chelate polymer preparation is carried out in the dark. An aqueous solution of the chelate polymer is coated on a thermally stable substrate, also in the dark. Water is removed by evaporation leaving only the chelate polymer on the substrate. The coated substrate is then exposed to actinic radiation under a predetermined pattern. An image is developed by removing the unexposed coating by dissolving the same in water or very dilute mineral acids.

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Light Sensitive Metal Organic Chelate Polymers

A light-sensitive, metal-organic chelate polymer is used to prepare printed circuits by direct circuit deposition techniques. A water soluble metal chelate polymer is prepared from polyethyleneimine and a silver salt, such as silver nitrate and a silver halide. The chelate polymer preparation is carried out in the dark. An aqueous solution of the chelate polymer is coated on a thermally stable substrate, also in the dark. Water is removed by evaporation leaving only the chelate polymer on the substrate. The coated substrate is then exposed to actinic radiation under a predetermined pattern. An image is developed by removing the unexposed coating by dissolving the same in water or very dilute mineral acids. The developed image is next heated to a temperature of about 250 degrees C to 275 degrees C at which time silver metal is deposited. Concurrent with the metal deposition the polymer matrix is decomposed and evolves as a gas, leaving only the metallic image on the substrate. Where the chelate polymer is initially coated on a metal substrate, the developed image, prior to heating, can function as a photoresist. The resist is stripped simultaneously during etching of the metal substrate.

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