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High Dielectric Constant Photoresist

IP.com Disclosure Number: IPCOM000093263D
Original Publication Date: 1967-Aug-01
Included in the Prior Art Database: 2005-Mar-06
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Angelo, RW: AUTHOR

Abstract

High dielectric constant photosensitive resists are prepared from an admixture of light-sensitized neoprene, poly chloro 1, 3-butadiene, and barium titanate pigments. For example, a mixture of equal parts by weight of barium titanate and light-sensitive neoprene is selectively exposed to light to give a printed circuit pattern. The materials so prepared can also be used for the fabrication of precision capacitors.

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High Dielectric Constant Photoresist

High dielectric constant photosensitive resists are prepared from an admixture of light-sensitized neoprene, poly chloro 1, 3-butadiene, and barium titanate pigments. For example, a mixture of equal parts by weight of barium titanate and light-sensitive neoprene is selectively exposed to light to give a printed circuit pattern. The materials so prepared can also be used for the fabrication of precision capacitors.

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