Browse Prior Art Database

Transport of Substrates for Multilayer Deposition in a Vacuum

IP.com Disclosure Number: IPCOM000093264D
Original Publication Date: 1967-Aug-01
Included in the Prior Art Database: 2005-Mar-06
Document File: 2 page(s) / 33K

Publishing Venue

IBM

Related People

Bertelsen, BI: AUTHOR [+3]

Abstract

When performing vacuum deposition operations in a high-vacuum system, it is desired to make as many depositions on as many substrates as possible without having to open the vacuum system. This system allows many substrates to be preheated, brought to a work station where vacuum deposition occurs, and stored after deposition. Also, the system is reversible, allowing successive depositions upon a single substrate. These depositions are carried out in a high-vacuum system, without need to open the vacuum system.

This text was extracted from a PDF file.
At least one non-text object (such as an image or picture) has been suppressed.
This is the abbreviated version, containing approximately 54% of the total text.

Page 1 of 2

Transport of Substrates for Multilayer Deposition in a Vacuum

When performing vacuum deposition operations in a high-vacuum system, it is desired to make as many depositions on as many substrates as possible without having to open the vacuum system. This system allows many substrates to be preheated, brought to a work station where vacuum deposition occurs, and stored after deposition. Also, the system is reversible, allowing successive depositions upon a single substrate. These depositions are carried out in a high- vacuum system, without need to open the vacuum system.

Substrates 1 are stored in vertical elevator system 2 which allows individual substrates 1 to be brought into position 1A prior to deposition. Elevator system 2 can contain heaters not shown. When a substrate 1 is in position 1A, it is engaged by crossbar 3 attached to endless chain conveyor belt 4. The latter moves substrate 1 to work position 1B by guiding it along substrate carrier guide rail 5. At work position 1B, the vapor source is allowed to impinge upon substrate 1 by use of a shutter system not shown. After deposition, substrate 1 is moved to storage position 1C.

As the substrate is moved from position 1B to 1C, guide bar 6 engages the next substrate 1, moved into position 1A by elevator system 2, and moves it to position 1B. Concurrently, guide bar 12 comes into the position formerly occupied by bars 6 and 3. As deposition occurs on the second substrate at position 1B, the first substr...