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Browse Prior Art Database

Integrated Circuit Generator

IP.com Disclosure Number: IPCOM000093309D
Original Publication Date: 1967-Aug-01
Included in the Prior Art Database: 2005-Mar-06
Document File: 2 page(s) / 55K

Publishing Venue

IBM

Related People

Grobin, AW: AUTHOR [+4]

Abstract

Holographic techniques are utilized to generate a composite hologram of a complete circuit pattern. The composite hologram is formed from individual holograms of the basic integrated circuit patterns. After processing, the composite hologram is utilized to form a photographic image of the actual circuit pattern.

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Integrated Circuit Generator

Holographic techniques are utilized to generate a composite hologram of a complete circuit pattern. The composite hologram is formed from individual holograms of the basic integrated circuit patterns. After processing, the composite hologram is utilized to form a photographic image of the actual circuit pattern.

Individual holograms of basic integrated circuit patterns such as emitters, base squares, isolation patterns, straight lines, etc., are formed and stored in library 1 for transport to the composite hologram generating system. Hologram H1 carrying a basic circuit pattern is used as a Fourier diffraction pattern in the system. It is position insensitive and therefore precise alignment with respect to the elements of the system is not required.

Laser source of light 2 provides a beam which passes through beam splitter 3 to lenses L1 and L2. The latter are set one focal length apart. A portion of the light beam is directed upwardly from beam splitter 3 to the array of polarizers and beam splitters. The lens combination L1 and L2 transforms hologram H1 and focuses the basic pattern on light deflector 4 which is controlled by electronic control system 5. Deflector 4 positions the pattern on diffuser 6 placed a distance D1 from photographic plate H2 that becomes the composite hologram. The projected image of a single base hole 7 can be deflected to as many different positions as desired on diffuser 6 during a single exposure period. The basic pattern can be repeated by either altering the deflector 4 position at a rate of speed greater than 100 cycles per second or by applying a voltage other than the half-wave voltage fr...