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Thermoplastic Recording Memory Panel Configuration and Development Erase System

IP.com Disclosure Number: IPCOM000093383D
Original Publication Date: 1967-Sep-01
Included in the Prior Art Database: 2005-Mar-06
Document File: 2 page(s) / 29K

Publishing Venue

IBM

Related People

Chang, LS: AUTHOR [+2]

Abstract

Thermoplastic recording films are normally developed by heating the thermoplastic material to about its melting point to cause the deformation pattern. This heating can be accomplished by electromagnetic radiation, if the thermoplastic recording film is formed with a absorbing layer. The latter underlies the thermoplastic layer which is capable of absorbing the wavelengths of radiation to which it is exposed. In drawing 1, the thermoplastic recording film comprises a relatively heat insensible substrate 1 carrying absorbing layer 2 and thermoplastic layer 3. Electrostatic charges in the form of a pattern are deposited on layer 3 by source 4. This pattern is developed into a deformation pattern by exposing the charged layer 3 to radiation source 5.

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Thermoplastic Recording Memory Panel Configuration and Development Erase System

Thermoplastic recording films are normally developed by heating the thermoplastic material to about its melting point to cause the deformation pattern. This heating can be accomplished by electromagnetic radiation, if the thermoplastic recording film is formed with a absorbing layer. The latter underlies the thermoplastic layer which is capable of absorbing the wavelengths of radiation to which it is exposed. In drawing 1, the thermoplastic recording film comprises a relatively heat insensible substrate 1 carrying absorbing layer 2 and thermoplastic layer 3. Electrostatic charges in the form of a pattern are deposited on layer 3 by source 4. This pattern is developed into a deformation pattern by exposing the charged layer 3 to radiation source 5. Layer 3 is transparent to the wavelengths of radiation which are absorbed by layer 2. The radiation energy absorbed in layer 2 generates heat sufficient to cause the deformation of layer 3. With the configuration of drawing 1, the substrate can be opaque. However, if it is transparent to the wavelengths of the developing radiation, radiation source 5 can be positioned on the back side of the thermoplastic recording film as in drawing 2. In addition, this configuration is necessary if the thermoplastic recording film has an additional opaque conducting layer 6 overlying the absorbing layer as in drawing 3. If desired, the free surface of the...