Browse Prior Art Database

Thermal Diazo Microcopier

IP.com Disclosure Number: IPCOM000093458D
Original Publication Date: 1967-Sep-01
Included in the Prior Art Database: 2005-Mar-06
Document File: 2 page(s) / 51K

Publishing Venue

IBM

Related People

Hafer, CH: AUTHOR

Abstract

U.S. Patent 3,323,436 describes a device adapted for use in developing a diazotype film with ammonia gas under high pressure.

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Thermal Diazo Microcopier

U.S. Patent 3,323,436 describes a device adapted for use in developing a diazotype film with ammonia gas under high pressure.

In the above drawing, it is shown how this device can be modified to permit the developing of not only diazotype film but also vesicular type film. The modification primarily comprises replacing the backup platen of the device with backup platen 1 containing heaters 2 and thermister 3 for sensing the temperature. Also, heat distribution plate 4 is attached to the face of platen 1. An insulating gasket 5 is disposed on the rear of platen 1.

In operation, the modified device performs in the same manner as described in the patent, except that the film is heated by plate 4 during development. That is, with film 6 inserted between platen 1 carrying plate 4 and developing platen 7 as shown in drawing 2, plunger 8 is activated and operates to push platen 1 and film 6 against platen 7. Ammonia gas enters the chamber formed by platen 7 and film 6 through a port 9 and causes the development of the film if it is a diazotype. Conversely, if the film is a vesicular type, the ammonia gas applies positive pressure and forces the film against the heat distribution plate 4. The heat from plate 4 causes the development of the film.

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