Browse Prior Art Database

Ultrasonic Fountain Processor

IP.com Disclosure Number: IPCOM000093460D
Original Publication Date: 1967-Oct-01
Included in the Prior Art Database: 2005-Mar-06
Document File: 2 page(s) / 49K

Publishing Venue

IBM

Related People

Keller, CJ: AUTHOR

Abstract

The apparatus effects intimate contact between processing fluid 1 and a workpiece such as semiconductor wafer 2 by use of an ultrasonic generator.

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Ultrasonic Fountain Processor

The apparatus effects intimate contact between processing fluid 1 and a workpiece such as semiconductor wafer 2 by use of an ultrasonic generator.

The structure includes a standard ultrasonic driver 3 contained within housing 4 and coupled to liquid vat or tank 5 recessed in solid structure 15 to provide thick bottom wall 16. Fluid 1 is supplied to sink 5 by inlet 6 in sufficient velocity and amount to provide continuous flow and to form meniscus 7 above the top of sink 5. Excess liquid spills over the structure into a drain tank, defined within the inner housing wall 17 and the annular outer wall 18, from which it is removed by outlet 9 for reprocessing or storage.

Included with the structure is a horizontally reciprocable vacuum support 10 for the backside of wafer 2. Support 10 is mounted at a height so that the free face 11 of wafer 2 is in line with a mid-portion of meniscus 7. In this manner, wafer 2 is moved in its plane so that its free face 11 moves along line 12 into meniscus 7 without submersion of wafer 2 into fluid 1.

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