Browse Prior Art Database

Artwork Registration Device for Double Sided Etching

IP.com Disclosure Number: IPCOM000093598D
Original Publication Date: 1967-Nov-01
Included in the Prior Art Database: 2005-Mar-06
Document File: 2 page(s) / 43K

Publishing Venue

IBM

Related People

Hines, WC: AUTHOR [+2]

Abstract

Because single-sided etching in the manufacture of printed circuits causes undercutting of the etched circuit, double-sided etching is preferred, but presents a registration problem in the artwork creation of the master for the etched pattern.

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Artwork Registration Device for Double Sided Etching

Because single-sided etching in the manufacture of printed circuits causes undercutting of the etched circuit, double-sided etching is preferred, but presents a registration problem in the artwork creation of the master for the etched pattern.

This problem is overcome by employing registration frame 1 in the following process. Into one half 2 of frame 1 is rigidly positioned glass 3 carrying a photographic emulsion 4. After exposure to the circuit pattern 5, exposed emulsion 4 is developed. Next, into the other half 6 of frame 1 is rigidly positioned a second glass 7 carrying photographic emulsion 8. Halves 2 and 6 of frame 1 are then brought together. Lateral motion relative to each other is prevented by studs 9 of frame half 2 in holes 10 of frame half 6.

With the halves of the frame together, the unexposed emulsion 8 and the exposed and developed emulsion 4 are in face-to-face contact.

Using vacuum exposure frame 11, the unexposed emulsion 8 is exposed through developed emulsion 4. After emulsion 8 is developed, there exists two artwork masters in perfect registration for exposing, for example, both sides of a sheet of copper coated on each side with a layer of photoresist. The latter, after development, provides the patterns for double-sided etching of the copper sheet.

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