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Browse Prior Art Database

Centrifuge Rack

IP.com Disclosure Number: IPCOM000093657D
Original Publication Date: 1966-Jan-01
Included in the Prior Art Database: 2005-Mar-06
Document File: 2 page(s) / 64K

Publishing Venue

IBM

Related People

Auslander, HO: AUTHOR

Abstract

This centrifuge rack permits a plurality of objects, e.g., semiconductor wafers, to be held while being subjected to a coating operation. By its structural arrangement, the centrifuge substantially prevents vibration.

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Centrifuge Rack

This centrifuge rack permits a plurality of objects, e.g., semiconductor wafers, to be held while being subjected to a coating operation. By its structural arrangement, the centrifuge substantially prevents vibration.

Centrifuging techniques have been used for depositing glass particles, suspended in a fluid located in a centrifuging container, onto the surface of a semiconductor wafer located at the bottom of the container. A thin, hole-free, glass film is subsequently formed on the surface of the wafer by heat treatment at a temperature and for a period of time sufficient to melt the particles and fuse them into a glass film.

This centrifuging arrangement utilizes centrifuge container 1 having a scalloped configuration and rack 2 which holds a plurality of semiconductor wafers 3. Rack 2 contains a number of disks 4 mounted in a tiered array. Each disk 4 is capable of supporting a plurality of semiconductor wafers in circular recess portions 5. Each portion 5 has an aperture 6 to prevent formation of a film of fluid beneath a wafer 3.

Cutout portion 7 permits rapid removal of a wafer 3 with tweezers from a portion 5. Each disk 4 can hold eight wafers 3. Handle 8 facilitates insertion and removal of rack 2 from container 1. Glass particle containing fluid 9 is preferably put into container 1 before rack 2. Then cover 10 closes container 1 which is ready for centrifuging.

The relationship between given height of the glass suspension over each wafer...