Browse Prior Art Database

Exposing Cylindrical Photoresists

IP.com Disclosure Number: IPCOM000093697D
Original Publication Date: 1966-Jan-01
Included in the Prior Art Database: 2005-Mar-06
Document File: 2 page(s) / 29K

Publishing Venue

IBM

Related People

Lowry, R: AUTHOR

Abstract

The method transfers a flat image from a glass master to a photoresist layer on the outside of a cylinder. The glass master is covered by a layer of nearly opaque liquid. The cylinder is immersed in the liquid and lowered over the master in synchronism with movement of a light source beneath the master to expose successive portions of the photoresist. Each portion is exposed only along the line of contact between the cylinder and the master. The opaque liquid is effective to limit the exposure to a narrow band extending along the line of contact.

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Exposing Cylindrical Photoresists

The method transfers a flat image from a glass master to a photoresist layer on the outside of a cylinder. The glass master is covered by a layer of nearly opaque liquid. The cylinder is immersed in the liquid and lowered over the master in synchronism with movement of a light source beneath the master to expose successive portions of the photoresist. Each portion is exposed only along the line of contact between the cylinder and the master. The opaque liquid is effective to limit the exposure to a narrow band extending along the line of contact.

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