Browse Prior Art Database

Dimension Control of Photolithographically Produced Patterns

IP.com Disclosure Number: IPCOM000093958D
Original Publication Date: 1966-Apr-01
Included in the Prior Art Database: 2005-Mar-06
Document File: 2 page(s) / 33K

Publishing Venue

IBM

Related People

Schaible, PM: AUTHOR

Abstract

The precise dimensions of a mask opening can be controlled over a substantial range while still using a single master mask. Master mask 1 is located on glass substrate 2. A film to be etched, such as resistor film 3, located on substrate 4 having applied to it a photoresist coating 5, is positioned adjacent to mask 1. The space between mask 1 and coating 5 during exposure to columnated light 6 controls the dimensions of the photolithographically produced patterns in the photoresist film. The spacing between mask 1 and coating 5 can be made by use of shims 7. For example, 1.00 mil and 2.00 mil master mask lines exposed in the photoresist film, developed and etched are reproduced as in this table. Mask to Film 5 Reproduction of Reproduction of Separation 1.00 mil mask line 2.

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Dimension Control of Photolithographically Produced Patterns

The precise dimensions of a mask opening can be controlled over a substantial range while still using a single master mask. Master mask 1 is located on glass substrate 2. A film to be etched, such as resistor film 3, located on substrate 4 having applied to it a photoresist coating 5, is positioned adjacent to mask 1. The space between mask 1 and coating 5 during exposure to columnated light 6 controls the dimensions of the photolithographically produced patterns in the photoresist film. The spacing between mask 1 and coating 5 can be made by use of shims 7. For example, 1.00 mil and
2.00 mil master mask lines exposed in the photoresist film, developed and etched are reproduced as in this table.

Mask to Film 5 Reproduction of Reproduction of Separation 1.00 mil mask line 2.00 mil mask line 0" 1.04 mil 2.04 mil

0.0005" 1.2 mil 2.2 mil

0.001" 1.3 mil 2.35 mil

0.002" 1.5 mil 2.5 mil.

These data show that the nominal width of a 2 mil line can be changed by about 5% per 0.0005" mask-to-object separation. Changing the mask-to-object separation has the same effect as having an additional mask to produce the dimensional change without the added need of fabricating an additional mask.

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