Browse Prior Art Database

Electroless Plating of Magnetic Thin Films

IP.com Disclosure Number: IPCOM000093981D
Original Publication Date: 1966-Apr-01
Included in the Prior Art Database: 2005-Mar-06
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Romankiw, LT: AUTHOR [+4]

Abstract

Magnetic thin films of the type finding adaptation as computer components are formed from an electroless plating solution.

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Electroless Plating of Magnetic Thin Films

Magnetic thin films of the type finding adaptation as computer components are formed from an electroless plating solution.

A substrate of a predetermined configuration is sensitized and activated by conventional techniques. Then, the substrate is immersed in an electroless solution containing: NaH(2)PO(2) - H(2)O from 3.0 to 50 grams/liter Ni/++/ from 0.3 to 20 grams/liter Fe/++/ or Fe/+++/ 0.1 to 20 grams/liter Sodium potassium tartrate 3 to 100 grams/liter.

Ammonia is added to the solution to adjust the pH which lies in the range between 6.0 to 13, while the temperature of the bath is regulated to lie between 10 degrees to 50 degrees C. The substrate is maintained in the solution for a period varying between 1 minute to 1000 minutes to produce a film having a thickness between 600 to 40,000 angstroms. The plating is performed in the presence of an orienting field when anisotropic properties are sought.

In this manner, magnetic thin films, characterized by those properties desired for storage and switching applications, are made in a plating solution in which the temperature sensitivity, experienced with many other types of solutions, is overcome.

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