Browse Prior Art Database

Semiconductor Wafer Barrel

IP.com Disclosure Number: IPCOM000093998D
Original Publication Date: 1966-Apr-01
Included in the Prior Art Database: 2005-Mar-06
Document File: 2 page(s) / 61K

Publishing Venue

IBM

Related People

Hause, JR: AUTHOR

Abstract

This barrel device can be used to batch process a plurality of semiconductor wafers. The device is particularly useful for cleaning, etching, and drying of thin semiconductor wafers in the production of semiconductor devices.

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Semiconductor Wafer Barrel

This barrel device can be used to batch process a plurality of semiconductor wafers. The device is particularly useful for cleaning, etching, and drying of thin semiconductor wafers in the production of semiconductor devices.

Barrel 10 has a plurality of disks 12, provided with spaced apertures in the peripheries thereof, mounted on longitudinally extending rods 14 extending through the apertures and secured to end plates 16 and 18. Shaft portions 20 and 22 are integral parts of end plates 16 and 18, respectively, which rotatably support the barrel 10. A gear 24 is mounted on end plate 16. Spacer washers 26 are disposed on rods 14 between disks 12. Removable rod 28 is disposed in aligned apertures in disks 12 and is engaged to end plate 16 by threading.

In operation barrel 10 is loaded by removing rod 28, placing wafers 30 between disks 12 through the resultant opening, replacing rod 28, and then rotating barrel 10 in an appropriate cleaning or etching solution. Barrel 10 is supported on shafts 20 and 22 and driven by gear 24. Barrel 10 is capable of handling a plurality of wafers. It provides a uniform liquid flow over the surfaces of the wafers being processed to thus provide an even and uniform etching action.

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