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Stripping Agent for Photoresists

IP.com Disclosure Number: IPCOM000094031D
Original Publication Date: 1966-May-01
Included in the Prior Art Database: 2005-Mar-06
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Bakos, P: AUTHOR [+2]

Abstract

In manufacturing printed circuits, a stripping solution for removing aromatic-containing photoresists is comprised of 1-2 grams of picric acid (2, 4, 6 -- trinitrophenol) or trichloroacetic acid in 200 milliliters of dimethyl sulfoxide (DMSO).

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Stripping Agent for Photoresists

In manufacturing printed circuits, a stripping solution for removing aromatic- containing photoresists is comprised of 1-2 grams of picric acid (2, 4, 6 -- trinitrophenol) or trichloroacetic acid in 200 milliliters of dimethyl sulfoxide (DMSO).

These materials function as strong acids in DMSO, even exceeding the strength of hydrochloric acid in it. The solution is readily soluble with water in all proportions, and possesses excellent stripping action from 40-80 degrees C.

Complete stripping of KPR*, KPL**, KOR** and DCR*** films is accomplished in approximately one minute employing this technique.

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