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Rate Monitor for Glass Deposition Rate in RF Sputtering

IP.com Disclosure Number: IPCOM000094073D
Original Publication Date: 1966-May-01
Included in the Prior Art Database: 2005-Mar-06
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Grantham, DH: AUTHOR [+2]

Abstract

The intensity of the glow in RF sputtering is a very sensitive indicator of the sputtering rate in a fixed geometry system. In the sputtering of glasses where there is no problem with window darkening due to coating with an opaque film, it is possible to control and monitor the deposition rate by using a photosensitive device to monitor the glow intensity. For control there is used the output of the photocell to make minor changes in the input power or chamber pressure to maintain constant glow, hence constant rate. A second method for controlling deposition thickness is to integrate the total glow intensity value even though it varies during a run. This integrated total is used to determine the proper time for a desired thickness.

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Rate Monitor for Glass Deposition Rate in RF Sputtering

The intensity of the glow in RF sputtering is a very sensitive indicator of the sputtering rate in a fixed geometry system. In the sputtering of glasses where there is no problem with window darkening due to coating with an opaque film, it is possible to control and monitor the deposition rate by using a photosensitive device to monitor the glow intensity. For control there is used the output of the photocell to make minor changes in the input power or chamber pressure to maintain constant glow, hence constant rate. A second method for controlling deposition thickness is to integrate the total glow intensity value even though it varies during a run. This integrated total is used to determine the proper time for a desired thickness.

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