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Integrated Multiple Electron Beam Deflection System

IP.com Disclosure Number: IPCOM000094202D
Original Publication Date: 1966-Jul-01
Included in the Prior Art Database: 2005-Mar-06
Document File: 2 page(s) / 50K

Publishing Venue

IBM

Related People

Evans, PF: AUTHOR [+2]

Abstract

This beam deflection system is an integrated structure. It deflects multiple electron beams either one at a time or in parallel, depending on system requirements.

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Integrated Multiple Electron Beam Deflection System

This beam deflection system is an integrated structure. It deflects multiple electron beams either one at a time or in parallel, depending on system requirements.

Deflection device 1 is made from a ceramic disk that is partially machined after firing. Sets of parallel grooves 2 and 3 are machined into each opposite side of the disk to a depth that is determined by the desired deflection plate length. All grooves in a set are parallel to all others in that set. The direction of each set 2 of grooves with respect to the other set 3 is orthogonal, i. e., each groove in a set is orthogonal to each groove on the opposite side of the disk. In this manner, x and y deflection plates 4 and 5, respectively, are provided.

The disk thickness is chosen so that a small web is left between the sets of grooves. The entire ceramic piece is then metallized by conventional electroless plating techniques, after which the grooves are extended into each other. Excess metallizing is then removed and alternate plates, within the same set, are joined together with conductive paint. Consequently, the x and y deflection plates are laterally displaced from each other by a small distance.

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