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Browse Prior Art Database

Integrated Circuitry Interconnection Generator

IP.com Disclosure Number: IPCOM000094211D
Original Publication Date: 1966-Jul-01
Included in the Prior Art Database: 2005-Mar-06
Document File: 2 page(s) / 32K

Publishing Venue

IBM

Related People

Evans, PF: AUTHOR [+2]

Abstract

This system generates interconnection patterns for integrated circuitry. A pattern such as 1 is to be generated on sensitized surface 2 of wafer 3. A row of ultraviolet light bulbs 4 emits light. This is projected by lens 5 onto surface 2 and line 1 is thus exposed. The interconnection line widths are a function of the bulb diameter and the reduction of the lens.

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Integrated Circuitry Interconnection Generator

This system generates interconnection patterns for integrated circuitry. A pattern such as 1 is to be generated on sensitized surface 2 of wafer 3. A row of ultraviolet light bulbs 4 emits light. This is projected by lens 5 onto surface 2 and line 1 is thus exposed. The interconnection line widths are a function of the bulb diameter and the reduction of the lens.

For a completely static system, a two-dimensional array of ultra-violet light bulbs is provided. The lighting of the bulbs is programmed to expose the desired two-dimensional patterns.

For a dynamic system, only one row of bulbs is required. The wafer is moved mechanically and the bulbs are programmed to expose the desired pattern in one dimension. To obtain exposure in the other dimension, the wafer itself is turned through 90 degrees and the process is repeated.

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