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Sheet Resistance Monitor for Deposition of Thin Films

IP.com Disclosure Number: IPCOM000094254D
Original Publication Date: 1966-Aug-01
Included in the Prior Art Database: 2005-Mar-06
Document File: 2 page(s) / 36K

Publishing Venue

IBM

Related People

Holmwood, RA: AUTHOR [+2]

Abstract

The device continuously measures the sheet resistance during the deposition of an electrical resistance coating. The device in drawings I and II includes round insulator substrate 1 provided with four metal electrical contacts 2. The latter are equally spaced around the edge of substrate 1. Each contact 2 consists of a land and a narrow line pointing toward the center of substrate 1. The latter is inserted and clamped into metal ring holder 3. This has four holes A, B, C, and D above contacts 2. The edges of holes A... D and the inner rim of ring 3 are raised off the substrate 1 surface to avoid contact with the film to be deposited. Spring-loaded or bonded electrical wires 5 are brought in through holes A... D. The inner circular opening can have a diameter of approximately 11".

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Sheet Resistance Monitor for Deposition of Thin Films

The device continuously measures the sheet resistance during the deposition of an electrical resistance coating. The device in drawings I and II includes round insulator substrate 1 provided with four metal electrical contacts
2. The latter are equally spaced around the edge of substrate 1. Each contact 2 consists of a land and a narrow line pointing toward the center of substrate 1. The latter is inserted and clamped into metal ring holder 3. This has four holes A, B, C, and D above contacts 2. The edges of holes A... D and the inner rim of ring 3 are raised off the substrate 1 surface to avoid contact with the film to be deposited. Spring-loaded or bonded electrical wires 5 are brought in through holes A... D. The inner circular opening can have a diameter of approximately 11". The narrow tips of contacts 2 protrude slightly into this opening. This configuration produces a circular deposited film area 6 as shown in drawing III which is contacted by the four very small metal contacts each at 90 degree angles to one another.

During the deposition, a constant current 1(AB) is injected at contacts tacts A and B and the voltage V(CD) is measured between contacts C and D. The sheet resistance R(s) is given by the voltage-current measurement. R(s) = 4.53 V(CD)I(AB)

By selecting a constant current I(AB) of 4.53 milliamps, the voltage V(CD) in millivolts is a direct indication of the sheet resistance in ohms per squa...