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Browse Prior Art Database

Photosensitive Compositions

IP.com Disclosure Number: IPCOM000094311D
Original Publication Date: 1966-Sep-01
Included in the Prior Art Database: 2005-Mar-06
Document File: 2 page(s) / 26K

Publishing Venue

IBM

Related People

Luzzi, JJ: AUTHOR

Abstract

In this photosensitive composition, there is the incorporation of nitrogen linkages in the polymer backbone. Polymers of the form shown in drawing A are sensitive to ultraviolet and blue light. The action of the light is to make the material insoluble. Thus, these materials can be used as negative photoresists.

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Photosensitive Compositions

In this photosensitive composition, there is the incorporation of nitrogen linkages in the polymer backbone. Polymers of the form shown in drawing A are sensitive to ultraviolet and blue light. The action of the light is to make the material insoluble. Thus, these materials can be used as negative photoresists.

These polymers can be synthesized by starting with suitable ethylenimines such as 2-methyl, 2-ethyl, etc., to give amine-containing polymers shown in drawing B.

The photochemical activity of these materials can be greatly enhanced by adding a photosensitizer such a p, p' -tetramethyl diaminobenzophenome, i. e., Michler's ketone. A thermally stable photoresistive material results.

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